Abstract
Results of modeling by the Monte Carlo method of signals from a scanning electron microscope examining rectangular grooves in silicon are compared with experimental results obtained for a scanning electron microscope operating in the secondary slow electron collection mode. The comparison is performed for the peaks of signals characterizing the primary electron beam near the walls of rectangular grooves: the widths and amplitudes of the peaks, the integral contributions of the peaks, and the positions of the peaks relative to the walls of the grooves. The parameters and their dependences on the primary electron energy are compared. All dependences are very different in terms of the parameters of the peaks and their dependence on the primary electron energy. This proves that the traditional representation of the Monte Carlo method does not work in scanning electron microscopy.
Article PDF
Similar content being viewed by others
Avoid common mistakes on your manuscript.
References
J. I. Goldstein, D. E. Newbury, P. Echlin, D. C. Joy, C. Fiori, and E. Lifshin, Scanning Electron Microscopy and X-Ray Microanalysis. A Text for Biologists, Materials Scientists, and Geologists (Plenum Press, New York, London, 1981).
L. Reimer, Scanning Electron Microscopy: Physics of Image Formation and Microanalysis (Springer, Berlin, Heidelberg, New York, 1998).
Scanning Microscopy for Nanotechnology. Techniques and Applications, Ed. by W. Zhou and Z. L. Wang (Springer Science+Business Media, New York, 2006).
International Technology Roadmap for Semiconductors, 2013 Edition, Metrology (2013).
Yu. A. Novikov and A. V. Rakov, Meas. Tech. 42 (1), 20–26 (1999).
M. T. Postek and A. E. Vladar, Critical Dimension Metrology and the Scanning Electron Microscope, Handbook of Silicon Semiconductor Metrology, Ed. by A. C. Diebold (Marcel Dekker, New York, Basel, 2001), pp. 295–333.
M. T. Postek, Proc. SPIE 4608, 84–96 (2002).
M. Postek, Vestn. Tekh. Regul., No. 7, 8–17 (2007).
V. Gavrilenko, Yu. Novikov, A. Rakov, and P. Todua, Nanoindustriya, No. 4, 36–42 (2009).
V. P. Gavrilenko, Yu. A. Novikov, A. V. Rakov, and P. A. Todua, Proc. SPIE 7405, 740504-1–740504-8 (2009). doi 10.1117/12.826164
V. P. Gavrilenko, V. A. Kalnov, Yu. A. Novikov, A. A. Orlikovsky, A. V. Rakov, P. A. Todua, K. A. Valiev, and E. N. Zhikharev, Proc. SPIE 7272, 727227-1–727227-9 (2009). doi 10.1117/12.814062
Yu. A. Novikov, J. Surf. Invest.: X-ray, Synchrotron Neutron Tech. 8 (6), 1244–1251 (2014). doi 10.1134/S1027451014060123
Yu. A. Novikov, J. Surf. Invest.: X-ray, Synchrotron Neutron Tech. 9 (3), 604–611 (2015). doi 10.1134/S1027451015030325
Yu. A. Novikov, Russ. Microelectron. 43 (4), 258–269 (2014). doi 10.1134/S1063739714040076
Yu. A. Novikov, Russ. Microelectron. 43 (6), 427–437 (2014). doi 10.1134/S1063739714060079
Yu. A. Novikov, Russ. Microelectron. 44 (4), 269–282 (2015). doi 10.1134/S1063739715030075
Yu. A. Novikov, J. Surf. Invest.: X-ray, Synchrotron Neutron Tech. 10 (1), 68–75 (2016). doi 10.1134/S1027451015060166
Y. G. Li, S. F. Mao, and Z. J. Ding, in Applications of Monte Carlo Method in Science and Engineering, Ed. by S. Mordechai (InTech, 2011), pp. 232–296.
V. Stary, in Applications of Monte Carlo Method in Science and Engineering, Ed. by S. Mordechai (InTech, 2011), pp. 195–230.
P. Zhang, H. Y. Wang, Y. G. Li, S. F. Mao, and Z. J. Ding, Scanning 34, 145–150 (2012). doi 10.1002/sca.20288
Y. G. Li, P. Zhang, and Z. J. Ding, Scanning 35, 127–139 (2013). doi 10.1002/sca.21042
Z. Ruan, M. Zhang, R. G. Zeng, Y. Ming, B. Da, S. F. Mao, and Z. J. Ding, Surf. Interface Anal. 46, 1296–1300 (2014). doi 10.1002/sia.5565
J. S. Villarrubia, A. E. Vladar, B. Ming, R. J. Kline, D. F. Sunday, J. S. Chawla, and S. List, Ultramicroscopy 154, 15–28 (2015).
Yu. A. Novikov, Phys., Chem., Mech. Surf. 11 (10), 1077–1084 (1995).
Yu. A. Novikov and A. V. Rakov, “Secondary electron emission from a relief surface of solids”, Mechanisms of secondary electron emission from a relief surface of solids, Moscow: Nauka. Fizmatlit, 1998, pp. 3–99; (Proc. IOFAN, Vol. 55). [in Russian].
K. A. Valiev, The Physics of Submicron Lithography (Plenum Press, New York, 1992).
M. Dapor, E. I. Rau, and R. A. Sennov, J. Appl. Phys. 102, 063705-1–063705-5 (2007).
M. Kadowaki, A. Hamaguchi, H. Abe, Y. Yamazaki, S. Borisov, A. Ivanchikov, and S. Babin, Proc. SPIE 7272, 72723I-1–72723I-9 (2009).
Ch. P. Volk, Yu. A. Novikov, Yu. V. Ozerin, and A. V. Rakov, Meas. Tech. 44 (4), 365–369 (2001). doi 10.1023/A:1010911613346
Yu. A. Novikov, S. V. Peshekhonov, and I. B. Strizhkov, “The slit-like reference gauge structure for the SEM calibration and measurements of relief elements in submicron and nanometer ranges”, Problems of linear measurements of microobjects in nanometer and submicron ranges. Moscow: Nauka, 1995, pp. 20–40; (Proc. IOFAN, Vol. 49). [in Russian].
Yu. A. Novikov, V. P. Gavrilenko, A. V. Rakov, and P. A. Todua, Proc. SPIE 7042, 704208-1–704208-12 (2008). doi 10.1117/12.794834
Yu. A. Novikov and S. V. Peshekhonov, “The ellipsometry method errors of evaluation of a silicon and dioxide silicon film optical characteristics”, Problems of linear measurements of microobjects in nanometer and submicron ranges, Moscow: Nauka, 1995, pp. 107–118; (Proc. IOFAN, Vol. 49). [in Russian].
V. P. Gavrilenko, Yu. A. Novikov, A. V. Rakov, and P. A. Todua, Proc. SPIE 7718, 77181B-1–77181B-10 (2010). doi 10.1117/12.853898
R. W. Nosker, J. Appl. Phys. 40, 1872–1882 (1969).
I. Brodie and J. J. Muray, The Physics and Microfabrication (Plenum Press, New York, London, 1982).
Ch. P. Volk, E. S. Gornev, Yu. A. Novikov, Yu. I. Plotnikov, A. V. Rakov, P. A. Todua, Yu. A. Novikov and S. V. Peshekhonov, “Problems of measurement of geometric characteristics of electron probe of scanning electron microscope”, Linear measurements in micrometer and nanometer ranges for microelectronics and nanotechnology. Moscow: Nauka, 2006, pp. 77–120; (Proc. IOFAN, Vol. 62) [in Russian].
V. P. Gavrilenko, Yu. A. Novikov, A. V. Rakov, and P. A. Todua, Proc. SPIE 7042, 70420C-1–70420C-12 (2008). doi 10.1117/12.794891
A. F. Makhov, Fiz. Tverd. Tela 2 (9), 2172–2175 (1960).
Yu. A. Novikov, A. V. Rakov, and I. Yu. Stekolin, Physics, Chemistry, and Mechanics of Surfaces 10 (4), 501–511 (1995).
Yu. A. Novikov and A. V. Rakov, Surf. Invest. 15 (8), 1177–1194 (2000).
Author information
Authors and Affiliations
Corresponding author
Additional information
Original Russian Text © Yu.A. Novikov, 2017, published in Poverkhnost’, 2017, No. 8, pp. 73–86.
Rights and permissions
About this article
Cite this article
Novikov, Y.A. Monte Carlo method in scanning electron microscopy. 1. Modeling and experiment. J. Surf. Investig. 11, 853–864 (2017). https://doi.org/10.1134/S1027451017040243
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1027451017040243