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Porous Silicon Formation by Photoetching

Handbook of Porous Silicon

Abstract

The literature on the photoetching technique of preparing photoluminescent mesoporous silicon films using both hydrofluoric acid-based and alkali electrolytes is reviewed. The benefits of using an incoherent light source and specific oxidizing agents are highlighted. The technique is particularly useful for creating thin porous regions in n-type Si wafers, SOI wafers, micromachined wafers, or those that contain electronic circuitry

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Correspondence to Sadao Adachi .

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© 2014 Springer International Publishing Switzerland

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Adachi, S. (2014). Porous Silicon Formation by Photoetching. In: Canham, L. (eds) Handbook of Porous Silicon. Springer, Cham. https://doi.org/10.1007/978-3-319-04508-5_6-2

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  • DOI: https://doi.org/10.1007/978-3-319-04508-5_6-2

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  • Publisher Name: Springer, Cham

  • Online ISBN: 978-3-319-04508-5

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Chapter history

  1. Latest

    Porous Silicon Formation by Photoetching
    Published:
    27 December 2016

    DOI: https://doi.org/10.1007/978-3-319-04508-5_6-3

  2. Original

    Porous Silicon Formation by Photoetching
    Published:
    23 June 2014

    DOI: https://doi.org/10.1007/978-3-319-04508-5_6-2