Abstract
The diffusion coefficients of vanadium, chromium and manaanese in copper have been determined by the residual activity method with radioactive tracers V48, Cr51 and Mn54 in the temperature ranges between 955 and 1342 K, between 999 and 1338 K and between 971 and 1253 K, respectively. The temperature dependence of the diffusion coefficients is expressed by the following Arrhenius equations along with the probable errors:D V/Cu = (2.48 +0.53-0.44 ) x 10−4 exp [-(215 ± 2) kJ mol−1/RT] m2 per s,D Cr/Cu = (0.337 +0.124-0.090 ) x 10−4 exp [-(195 ± 3) kJ mol−1/RT] m2 per s,D Mn/Cu = (1.02 +0.22-0.18 ) x 10−4 exp [-(200 ± 2) kJ mol−1/RT] m2 per s.
Anomalous penetration profiles for the diffusion of Cr51 and Mn54 in the present results suggest that experimental results onD Cr/Cu andD Mn/Cu in the past have been influenced by oxidation and evaporation of the chemically active radiotracers during annealing for diffusion.
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formerly Graduate Student, Tohoku University
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Hoshino, K., Iijima, Y. & Hirano, KI. Diffusion of vanadium, chromium, and manganese in copper. Metall Trans A 8, 469–472 (1977). https://doi.org/10.1007/BF02661758
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DOI: https://doi.org/10.1007/BF02661758