Abstract
The design and operational characteristics of an interferometric technique for measuring thermal expansion of metals between room temperature and temperatures in the range 1500 K to their melting points are described. The basic method involves rapidly heating the specimen from room temperature to temperatures above 1500 K in less than 1 s by the passage of an electrical current pulse through it, and simultaneously measuring the specimen expansion by the shift in the fringe pattern produced by a Michelson-type polarized beam interferometer and the specimen temperature by means of a high-speed photoelectric pyrometer. Measurements of linear thermal expansion of tantalum in the temperature range 1500–3200 K are also described. The results are expressed by the relation:
where T is in K and l0 is the specimen length at 20°C. The maximum error in the reported values of thermal expansion is estimated to be about 1% at 2000 K and not more than 2% at 3000 K.
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Miiller, A.P., Cezairliyan, A. Transient interferometric technique for measuring thermal expansion at high temperatures: Thermal expansion of tantalum in the range 1500–3200 K. Int J Thermophys 3, 259–288 (1982). https://doi.org/10.1007/BF00503321
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DOI: https://doi.org/10.1007/BF00503321