Abstract
TiC coatings were grown on graphite substrates by the chemical vapour deposition technique, using gas mixtures of CH4-TiCl4-H2 at a total pressure of 10.7 kPa and at temperatures of 1400 and 1425 K. The growth rate and structure of the TiC coatings were investigated as a function of CH4 and H2 concentrations. The deposition rate of TiC increased with increasing CH4 flow rate, but did not change with H2 flow rate. This behaviour was explained by a mass transport theory. Thermodynamic analyses based on minimization of Gibbs' free energy predicted carbon codeposition with TiC. X-ray diffraction and Auger electron spectroscopy (AES) studies and microstructural observations, however, suggested that free carbon did not form. Textural analyses indicated that the growth of TiC coatings was initiated as randomly oriented crystallites, and as the thickness of the coatings increased, preferentially oriented columnar grains developed. The textures of TiC coatings with the same thickness changed from the 〈110〉 orientation to the 〈100〉 orientation with decreasing H2 flow rate for a constant CH4 flow rate. The CH4 concentration also greatly influenced the preferred orientation of the coatings.
Article PDF
Similar content being viewed by others
Explore related subjects
Discover the latest articles, news and stories from top researchers in related subjects.Avoid common mistakes on your manuscript.
References
M. Kominsky, R. Nielsen and P. Zschack, J. Vac. Sci. Technol. 20 (1982) 1304.
R. A. Langley, L. C. Emerson, J. B. Whitley and A. W. Mullendore, J. Nuclear Mater. 93&94 (1980) 479.
J. Y. Rossignol, F. Langlais and R. Naslain, in “Proceedings of the Ninth International Conference on CVD”, edited by M. Robinson, C. H. J. van den Brekel, G. W. Cullen, J. M. Blocher Jr and P. Rai-Choudhury (Electrochemical Society, Pennington, PA, 1984) p. 596.
L. Aggour, E. Fitzer and J. Schlichtinhg, in “Proceedings of the Fifth International Conference on CVD”, edited by J. M. Blocher, Jr, G. E. Vuillard and G. Wahl (Electrochemical Society, Pennington, PA, 1981) p. 142.
M. Klein and B. M. Gallois, in “Chemical Vapor Deposition of Refractory Metals and Ceramics”, edited by T. M. Besmann and B. M. Gallois. Symposium Proceedings, Vol. 168, (Materials Research Society, Pittsburgh, PA, 1989) p. 93.
J. S. Paik, PhD thesis, Stevens Institute of Technology, Hoboken, NJ (1991).
T. M. Besmann, Report TM-5775, Oak Ridge National Laboratory, TN (1977).
D. R. Stull and H. Prophet, “JANAF Thermochemical Tables”, 2nd Edn, NSRDS-NBS 37 GPO, Washington, DC (1971).
S. Eroglu and B. Gallois, J. de Physique IV, 3(C3) (1993) 155.
C. S. Barret and T. B. Massalski, “Structure of Metals”, 3rd Edn (Pergamon Press, Oxford, 1980) p. 204.
Joint Committee on Powder Diffraction Standards, File No. 6-0614 (JCPDS Philadelphia, PA, 1967).
F. C. Eversteyn, P. J. W. Severin, C. H. J. van den Brekel and H. L. Peek, J. Electrochem. Soc. 117 (1970) 925.
A. S. Grove, “Physics and Technology of Semiconductor Devices” (Wiley, New York, 1969) pp. 13–16.
S. Dushman, “Scientific Foundations of Vacuum Technique” (Wiley, New York, 1962) p. 77.
J. E. Sundgren, A. Rockett, J. E. Greene and U. Helmersson, J. Vac. Sci. Technol. A, 4 (1986) 2770.
D. W. Kim, Y. J. Park, J. G. Lee and J. S. Chun, Thin Solid Films 165 (1988) 149.
J. E. Sundgren, B. O. Johannsson and S. E. Karlsson, ibid. 105 (1983) 353.
S. Komiya, N. Umezu and T. Narusawa, ibid. 54 (1978) 51.
C. Jiang, T. Goto and T. Hirai, J. Mater. Sci. 25 (1990) 1086.
A. van der Drift, Phillips Research Reports 22 (1967) 267.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Eroglu, S., Gallois, B. Growth and structure of TiC coatings chemically vapour deposited on graphite substrates. JOURNAL OF MATERIALS SCIENCE 30, 1754–1759 (1995). https://doi.org/10.1007/BF00351606
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/BF00351606