Abstract
This paper reviews the instrumentation advances for x-ray microanalysis 1991–1997, with particular emphasis on energy dispersive x-ray spectrometers. Most developments have been aimed at improved convenience and reliability while offering sensitivity well below 1 keV, particularly for semiconductor applications. Although EDX technology matured during the 1980’s, previous methods of characterisation are now inadequate to reveal the variability in performance as a function of x-ray energy in this low energy region. Furthermore, at low beam voltages where K lines are not excited, computer processing of peak overlaps is the only way to obtain element intensities. In this situation, detector and electronic stability and reproducibility have to be substantially improved in order to achieve results anywhere near the limit of statistical precision.
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Statham, P.J. (1998). Recent Developments in Instrumentation for X-Ray Microanalysis. In: Love, G., Nicholson, W.A.P., Armigliato, A. (eds) Modern Developments and Applications in Microbeam Analysis. Mikrochimica Acta Supplement, vol 15. Springer, Vienna. https://doi.org/10.1007/978-3-7091-7506-4_1
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DOI: https://doi.org/10.1007/978-3-7091-7506-4_1
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