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The Growth of Vapor Deposited Amorphous Zr65Al7.5Cu27.5-Alloy Films: Experiment and Simulation

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Lectures on Applied Mathematics
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Abstract

The surface structures of amorphous Zr65Al7.5Cu27.5-alloy films prepared by ultra high vacuum physical vapor deposition are investigated with scanning tunneling microscopy to identify the major surface mechanisms for amorphous film growth. A fourier analysis of the STM images shows that curvature induced surface diffusion and a non-smoothing surface mechanism is present. Numerical simulations using a Monte-Carlo and a continuum model which includes adatom concentration triggered surface diffusion as additional coarsing mechanism are in excellent agreement with the experimental results.

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Dedicated to Professor Karl-Heinz Hoffmann on the occasion of his 60th birthday

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Mayr, S.G., Moske, M., Samwer, K. (2000). The Growth of Vapor Deposited Amorphous Zr65Al7.5Cu27.5-Alloy Films: Experiment and Simulation. In: Bungartz, HJ., Hoppe, R.H.W., Zenger, C. (eds) Lectures on Applied Mathematics. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-59709-1_16

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  • DOI: https://doi.org/10.1007/978-3-642-59709-1_16

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-64094-0

  • Online ISBN: 978-3-642-59709-1

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