Abstract
Multilayer structures consisting of YBaCuO, Al2O3 and CuO have been sputtered on various substrates. Resistivity measurements show almost no deterioration of the electrical properties of a superconducting YBaCuO film, on top of which first an A12O3 and then an YBaCuO film has been sputtered. First results of YBaCuO films deposited on the A12O3 barrier show a Tcof 65 K.
Scanning electron microscopy (SEM) and scanning Auger microscopy (SAM) as applied on a cross section of a multilayer indicate no diffusion between the Al2O3 and YBaCuO layers.
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© 1990 Plenum Press, New York
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de Nivelle, M.J.M.E., Häuser, B., Keim, E.G., Rogaila, H. (1990). Thin Aluminum Oxide Films as Electrical Barriers Between Superconducting Y-Ba-Cu-O Layers. In: Reed, R.P., Fickett, F.R. (eds) Advances in Cryogenic Engineering Materials . An International Cryogenic Materials Conference Publication, vol 36. Springer, Boston, MA. https://doi.org/10.1007/978-1-4613-9880-6_60
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DOI: https://doi.org/10.1007/978-1-4613-9880-6_60
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