Abstract
One of the approaches to improve the properties of polymers is to use additives in them. In the last few years, nanoscale additives have received attention due to the favorable properties they give to polymers in low concentrations. POSS or polyhedral oligomeric silsesquioxane has unique properties due to its nanometer size and organic–inorganic nature. The rigid structure of POSS and its compatibility with all types of polymers make their use attractive in various polymer industries. The concentration, structure of the mineral core, and type of POSS organic groups can affect the final properties of polymers containing these nanostructures. Chemical mixing of POSS with polymer increases the viscosity of the system, while physical mixing decreases the viscosity of the polymer. These nanostructures can improve properties such as tensile strength, modulus, and toughness of the polymer. Polymers with low concentrations of POSS have the advantage of high thermal stability and low flammability, which makes them ideal for applications in the aerospace industry where materials must withstand extreme temperatures and harsh environments. In addition, the low dielectric constant of POSS-containing polymers makes them useful for use in electronic components. The high specific surface of POSS allows the use of these nanostructures as supports for various catalysts. POSS is used in a wide range of industries including aerospace, biomedical, electronics and chromatography columns, etc.
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References
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Editing of the article and preparation of figures and diagrams was done by Abolfazl Moein. Abbas Kebritchi supervised the compilation of the article and the final review. All authors reviewed the manuscript.
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Moein, A., Kebritchi, A. New Insights into the Structure, Properties, and Applications of Polyhedral Oligomeric Silsesquioxane. Silicon 15, 5845–5875 (2023). https://doi.org/10.1007/s12633-023-02494-4
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DOI: https://doi.org/10.1007/s12633-023-02494-4