Editorial board
Editor-in-Chief:
Safa Kasap, University of Saskatchewan, Canada
Founding Editor and Former Editor-in-Chief:
Arthur F. W. Willoughby, Southampton University, United Kingdom
Deputy Editor-in-Chief:
Jun Luo, Chinese Academy of Sciences, China
Comments and Ethics Editor:
Asher C. Leff, TauMat, LLC, USA
Editors:
Peter Capper, SELEX Sistemi Integrati, United Kingdom
Homero Castaneda-Lopez, Texas A&M University, United States of America
Kalyan Kumar Chattopadhyay, Javadpur University, India
Nandu Chaure, Savitribai Phule Pune University, India
I.M. Dharmadasa, Sheffield Hallam University, United Kingdom
Chong Leong Gan; Micron Memory Taiwan, Taiwan
Senthil Murugan Ganapathy, University of Southampton, United Kingdom
Chris Groves, Durham University, United Kingdom
Maurizio Martino, Università del Salento, Italy
Hiroyoshi Naito, Osaka Prefecture University, Japan
Yun Hau Ng, City University of Hong Kong, Hong Kong
Henry H. Radamson, Royal Institute of Technology, Sweden
Jatin Rath, Indian Institute of Technology Madras, India
Karthik Shankar, University of Alberta, Canada
Velumani Subramaniam, CINVESTAV, Mexico
Stephen Sweeney, University of Surrey, United Kingdom
Hongjing Wu, Northwestern Polytechnical University, China
Wu Yan, China University of Geosciences (Wuhan), China
Takayuki Yanagida, Nara Institute of Science and Technology, Japan
Ying Yang, Tsinghua University, China
Bangmin Zhang, Sun Yat-Sen University, China
Fu Rong Zhu, Hong Kong Baptist University, Hong Kong
Assistant Editor:
Chunzi Zhang, University of Saskatchewan, Canada
Editorial Board:
Sadao Adachi, Gunma University, Japan; Dan Allwood, University of Sheffield, UK; Jayaram Archana, SRM Institute of Science and Technology, Chennai, India; Hajime Asahi, Osaka University, Japan; Mark Baker, University of Surrey, UK; Neil S. Beattie Northumbria University, UK; Bhaskar Bhattacharya, Banaras Hindu University, India; Rana Biswas, Ames Laboratory & Iowa State University, USA; Anna Paola Caricato, Università del Salento, Italy; Y.C. (Archie) Chan, City University of Hong Kong, China; Parthasarathi Chakraborti, Intel Corporation, Hillsboro, Oregon, USA; Kunji Chen, Nanjing University, China; W. (Jim) Choyke, University of Pittsburgh, USA; Antonin Fejfar, Academy of Sciences of the Czech Republic, Czech Republic; Christopher Gourlay, Imperial College London, UK; Jong Heo, Pohang University of Science and Technology, Korea; Oliver Ileperuma, Institute of Chemistry Ceylon, Sri Lanka; Alessia Irrera CNR- Institute for Chemical and Physical Processes (IPCF), Messina, Italy; Stuart J. C. Irvine, Swansea University, UK; Chennupati Jagadish, The Australian National University, Australia; David Jiles, Iowa State University, USA; Hannah J. Joyce, Cambridge University, UK; Zahangir Kabir, Concordia University, Canada; Iwan Kityk, Czestochowa University of Technology, Poland; Chien-Neng Liao, National Tsing Hua University, Taiwan; Qianqian Lin, Wuhan University, China; Leszek Malkinski, University of New Orleans, USA; Budhika Mendis, Durham University, UK; Yashowanta Mohapatra, Indian Institute of Technology Kanpur, India; Hadis Morkoç, Virginia Commonwealth University, USA; Hiroshi Nishikawa, Osaka University, Japan; Jiri Orava, Jan Evangelista Purkyne University in Usti nad Labem, Czech republic; Habib Pathan, Savitribai Phule Pune University, India; Kristin M. Poduska, Memorial University of Newfoundland, Canada; Adithya Prakash, Intersil, USA; Alla Reznik Lakehead University, Thunder Bay, Canada; Ben Ruck, Victoria University of Wellingon, New Zealand; Harry Ruda, University of Toronto, Canada; Arie Ruzin Tel Aviv University, Israel; Vasant Sathe, UGC-DAE Consortium for Scientific Research, India; Rajenda Singh Indian Institute of Technology Delhi, India; Rene van Swaaij, Delft University of Technology, The Netherlands; Katsuhisa Tanaka, Kyoto University, Japan; Ayse Turak, Concordia University, Canada; Takashi Uchino, Kobe University, Japan; Henk Vrielinck, Ghent University, Belgium; Neil White, University of Southampton, UK; Spyros Yannopoulos, University of Patras, Greece; Alex (Ya Sha) Yi, University of Michigan, USA; Shuye Zhang, Harbin Institute of Technology, China