Editorial board
Editor-in-Chief:
C. Barry Carter, University of Connecticut, Storrs, CT, United States of America
Deputy Editors-in-Chief:
Christopher F. Blanford, The University of Manchester, Manchester, United Kingdom
M. Grant Norton, Washington State University, Pullman, WA, United States of America
Editors:
Scott Beckman, Washington State University, Pullman, WA, United States of America
Kyle S. Brinkman, Clemson University, Clemson, SC, United States of America
Pedro Camargo, University of Helsinki, Helsinki, Finland
David P. Cann, Oregon State University, Corvallis, OR, United States of America
Biao Chen, Dr. Sci. (Eng.), Tianjin University, China
Chris Cornelius, University of Nebraska, Lincoln, NE, United States of America
Catalin Croitoru, Transilvania University of Brasov, Brasov, Romania
Andréa SS De Camargo, Federal Institute for Materials Research and Testing (BAM), Berlin, Germany
Stephen J. Eichhorn, University of Bristol, Bristol, United Kingdom
Till Frömling, Technische Universität Darmstadt, Darmstadt, Germany
Jean-François Gohy, Université Catholique de Louvain, Louvain, Belgium
Jaime Grunlan, Texas A&M University, College Station, TX, United States of America
Nima Haghdadi, Imperial College London, London, United Kingdom
Dale L. Huber, Sandia National Laboratories, Albuquerque, NM, United States of America
Maude Jimenez, University of Lille, Villeneuve d'Ascq, France
Kevin Jones, University of Florida, Gainesville, FL, United States of America
Yi David Ju, Royal Melbourne Institute of Technology, Melbourne, Victoria, Australia
Sumanta Kumar Karan, PhD, Pennsylvania State University, United States
Megumi Kawasaki, Oregon State University, Corvallis, OR, United States of America
Steven E. Naleway, University of Utah, Salt Lake City, UT, United States of America
Mohammad Naraghi, Texas A&M University, College Station, TX, United States of America
Philip Nash, University of Arizona, Tuscon, AZ, United States of America and Tianjin, China
Ghanshyam Pilania, Los Alamos National Laboratory, Los Alamos, NM, United States of America
Sophie Primig, University of New South Wales, Sydney, Australia
Subha Rath, Indian Institute of Technology Hyderabad, Sangareddy, India
N. Ravishankar, Indian Institute of Science, Bangalore, India
Greg Rutledge, Massachusetts Institute of Technology, Cambridge, MA, United States of America
Annela M. Seddon, Bristol University, Bristol, United Kingdom
Zhao Shen, Shanghai Jiao Tong University, Shanghai, China
Naiqin Zhao, Tianjin University, Tianjin, China
Peiyao Zhao, Tsinghua University, Beijing, China
Yao Zhou, PhD, Xi'an Jiaotong University, China
Invited Reviews Editor:
Philip Nash, Illinois Institute of Technology, Chicago, IL, United States of America
Outreach Editors:
Gang Liu, Xi’an Jiaotong University, Xi’an, China
Tiejun Zhu, Zhejiang University, Hangzhou, China
Editorial Board:
William Bonfield, (Chairman) University of Cambridge, United Kingdom
R. Abbaschian, University of California, Riverside, CA, USA; E. Baer, Case Western Reserve University, Cleveland, OH, USA; A.K. Bhowmick, University of Houston, Houston, USA; A. Boccaccini, University of Erlangen-Nuremberg, Germany; W. C. Carter, Massachusetts Institute of Technology, Cambridge, MA, USA; K. Chattopadhyay, Indian Institute of Science, Bangalore, India; K. Chawla, University of Alabama at Birmingham, USA; R.F. Cook, Winterville, NC, USA; G. Eggeler, Institut fur Werkstoffe, Bochum, Germany; J. H. Evans-Freeman, University of Canterbury, Canterbury, NZ; L.C. Feldman, Rutgers University, Piscataway, NJ, USA; D. Fray, University of Cambridge, UK; R. W. Grimes, Imperial College, London, UK; Y. Ikuhara, University of Tokyo, JFCC-Nagoya, and Tohoku University, Japan; W.D. Kaplan, Technion-Israel Institute of Technology, Haifa, Israel; H.S. Kim, POSTECH, Pohang, South Korea; K. Krishnan, University of Washington, Seattle, USA; T.G. Langdon, University of Southampton, UK; Y-W Mai, The University of Sydney, Australia; Z. Munir, University of California, Davis, CA; T.F. Page, University of Newcastle upon Tyne, UK; E. Rabkin, Technion- Israel Institute of Technology, Haifa, Israel; R. O. Ritchie, University of California, Berkeley, CA, USA; C. Russel, Friedrich-Schiller-University, Jena, Germany; H. Saka, Nagoya University, Japan; G. Solórzano, Pontificia Universidade Católica (PUC) Rio de Janeiro, Brazil; A.C. Taylor, Imperial College, London, UK; Z.L. Wang, Georgia Institute of Technology, Atlanta, USA; A.F.W. Willoughby, University of Southampton, UK; Yujie Xiong, USTC, Hefei, China; R.J. Young, The University of Manchester, UK; Y.T. Zhu, City University of Hong Kong, Kowloon, Hong Kong