Abstract
As well as the micro patterns, many functional surfaces exhibit micro/nano hierarchical patterns. Micro- and nano-patterned surfaces can be fabricated using various techniques including photolithography, electron-beams, and so on. However, these processes were developed for semiconductor fabrication and are not convenient for large-area applications. In this paper, we describe a manufacturing process for micro/nano hierarchical patterns using a laser and an abrasive air jet, whereby the laser is used to manufacture microscale patterns, and an abrasive air jet is applied to the micro-patterned surface to generate the nanoscale patterns. This method is a simple process that can be used to rapidly manufacture hierarchical patterns, making it suitable for large-area applications. We also developed a friction test system, which minimizes external vibrations and sample wear during the measurements. Our results showed that the coefficient of friction of the hierarchical patterns was 12% smaller than that of microscale patterns.
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Abbreviations
- C s :
-
Coefficient of maximum static friction
- C k =C f :
-
Coefficient of kinematic friction
- μ :
-
Dynamic viscosity
- U :
-
Velocity in friction test
- P :
-
Pressure in friction test
- O :
-
Initial sapphire surface
- N :
-
Nano patterned surface
- M :
-
Micro patterned surface
- M+N :
-
Micro/Nano hierarchical patterned surface
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Kim, M., Lee, S.M., Lee, S.J. et al. Effect on friction reduction of micro/nano hierarchical patterns on sapphire wafers. Int. J. of Precis. Eng. and Manuf.-Green Tech. 4, 27–35 (2017). https://doi.org/10.1007/s40684-017-0004-3
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DOI: https://doi.org/10.1007/s40684-017-0004-3