Abstract
Multiferroic BiFeO3/Bi3.25La0.75Ti3O12 films annealed in different atmospheres (N2 or O2) were prepared on Pt/Ti/SiO2/Si substrates via a metal organic decomposition method. Based on our experimental results, it is considered that, in the films annealed in N2, fewer Fe2+ ions while more oxygen vacancies are involved. As a result, at room temperature, predominated by the reduced Fe2+ fraction, lower leakage current and dielectric loss, better ferroelectric property while reduced magnetization are observed. However, the oxygen vacancies might be thermally activated at elevated temperature; thus, more strongly temperature-dependent leakage current and a higher dielectric relaxation peak are observed for the films annealed in N2.
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Huang, F., Lu, X., Wang, Z. et al. Impact of annealing atmosphere on the multiferroic and dielectric properties of BiFeO3/Bi3.25La0.75Ti3O12 thin films. Appl. Phys. A 97, 699–704 (2009). https://doi.org/10.1007/s00339-009-5297-9
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DOI: https://doi.org/10.1007/s00339-009-5297-9