Abstract
Recently, aspheric lenses have been developed to correct various aberrations and to produce optical elements with various functions. In particular, efforts have focused on fabrication miniaturized and compact elements that make the use of flat, diffractive optical elements such as zone plates to replace conventional lenses. Direct laser lithography is one of the typical methods used to manufacture such diffraction optical elements. By using a high magnification objective lens, it generates a laser beam with a spot size of less than 1 μm at the focal point. To produce a pattern, such as a diffraction grating, a chromium-coated surface is controllably exposed to this light. In this study, the process conditions for fabricating a zone plate using a direct laser lithography were studied by using an air-bearing type linear XY stage which can easily make various patterns including a zone plate array. The previous studies using a polar coordinate lithographic system have an advantage for fabricating the circular type zone plate because the system uses a rotational stage. It, however, is not proper to fabricate an array type diffractive optics element. In this study, we used a rectangular type lithographic system by using an XY stage and tested the fabrication issues such as a runout error. The optical performance of the zone plate array fabricated by the suggested method was also verified by experimental evaluation.
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Srisungsitthisunti P, Ersoy OK, Xu X (2009) Laser direct writing of volume modified Fresnel zone plates. J Opt Soc Am 24(9):2090–2096
Wieland M, Frueke R, Wilhein T, Spielmann C, Pohl M, Kleineberg U (2002) Submicron extreme ultraviolet imaging using high-harmonic radiation. Appl Phys Lett 81(14):2520–2522
Suzuki Y, Takeuchi A, Takano H, Uesugi K, Oka T, Inoue K (2004) X-ray imaging microscopy using Fresnel zone plate objective and quasimonochromatic undulator radiation. Rev Sci Instrum 75(4):1155–1157
Smith HI, Menon R, Patel A, Chao D, Walsh M, Barbastathis G (1994) Zone-plate-array lithography: A low-cost complement or competitor to scanning-electron-beam lithography. Microelectron Eng 33(4):567–572
Tripathi A, Chronis N (2011) A doublet microlens array for imaging micron sized objects. J Micromech Microeng 21(105024):1–6
Arimoto H, Javidi B (2001) Integral three-dimensional imaging with digital reconstruction. Opt Lett 26(3):157–159
Izatt JA, Kulkarni MD, Wang HW, Kobayashi K, Sicak MV (1996) Optical coherence tomography and microscopy in gastrointestinal tissues. IEEE J Sel Top Quantum Electron 2(4):1017–1028
Barea LA, von Zuben AA, M-Brahim T, Montagnoli AN, Hospital M, Frateschi N, and Cirino GA (2015) Fresnel zone plate array fabricated by Maskless lithography. 2015 30th symposium on microelectronics technology and devices (SBMicro)
Yoon GY, Jitsuno T, Nakatsuka M, Nakai S (1996) Shack Hartmann wave-front measurement with a large F-number plastic microlens array. Appl Opt 35(1):188–192
Montiel F, Nevierse M (1996) Electromagnetic study of a photolithography setup for periodic masks and application to non periodic masks. J Opt Soc Am A 13(7):1429–1438
Rhee HG, Lee YW (2010) Improvement of linewidth in laser beam lithographed computer generated hologram. Opt Express 18(2):1734–1740
Kim DI, Rhee HG, Song JB, Lee YW (2007) Laser output stabilization for direct laser writing system by using an acousto-optic modulator. Rev Sci Instrum 78(10):103110/1–103110/4
Kim YG, Rhee HG, Ghim YS (2017) Dual-line fabrication method in direct laser lithography to reduce the manufacturing time of diffractive optics elements. Opt Expree 25(3):1636–1645
Poleshchuk AG, Churin EG, Koronkevich VP, Korolkov VP, Kharussov AA, Cherkashin VV, Kiryanov VP, Kiryanov AV, Kokarev SA, Verhoglyad AG (1999) Polar coordinate laser pattern generator for fabrication of diffractive optical elements with arbitrary structure. Appl Opt 38:1295–1301
Kim YG, Rhee HG, Ghim YS, Lee YW (2016) Parametric study for a diffraction optics fabrication by using a direct laser lithographic system. J Korean Soc Precision Eng 33(10):845–850
Harasaki A, Schmit J, Wyant JC (2000) Improved vertical-scanning interferometry. Appl Opt 39(13):2017–2115
Deck L, de Groot P (1994) High-speed noncontact profiler based on scanning white-light interferometry. Appl Opt 33(31):7334–7338
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Kim, YG., Rhee, HG., Ghim, YS. et al. Method of fabricating an array of diffractive optical elements by using a direct laser lithography. Int J Adv Manuf Technol 101, 1681–1685 (2019). https://doi.org/10.1007/s00170-018-3058-7
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DOI: https://doi.org/10.1007/s00170-018-3058-7