Abstract
High-rate anodic dissolution of hafnium in water-isopropanol-glycerin chloride solutions is studied in relation to the alcohol concentration and electrolyte temperature by voltammetric, chronoamperometric, and photoelectric measurements. The dissolution mechanism varies with increasing potential: upon reaching a potential of 0.4 to 0.5 V, the diffusion control of the process is replaced by kinetic one. It is supposed that the anodic behavior of hafnium is determined by the properties of surface nonstoichiometric semiconducting films, which are present on the metal under all studied conditions.
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Lilin, S.A., Balmasov, A.V., Shmukler, M.V. et al. Anodic behavior of hafnium in water-alcohol solutions of sodium chloride. Prot Met 36, 228–231 (2000). https://doi.org/10.1007/BF02758395
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DOI: https://doi.org/10.1007/BF02758395