Abstract
Single- and multiple-shot damage thresholds and plasma-emission thresholds for fused silica and CaF2 are reported for 790 nm photons as a function of laser pulse width (190 fs – 4.5 ps). The results are compared with single-shot plasma-emission measurements [1] and with multiple-shot damage measurements [2]. Both the damage threshold and the plasma-emission threshold are shown to decrease with decreasing pulse width over the entire pulse-width range investigated.
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Varel, H., Ashkenasi, D., Rosenfeld, A. et al. Laser-induced damage in SiO2 and CaF2 with picosecond and femtosecond laser pulses. Appl. Phys. A 62, 293–294 (1996). https://doi.org/10.1007/BF01575098
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DOI: https://doi.org/10.1007/BF01575098