Abstract
The effects of plasma etching on surface structure and chemistry of several papers have been investigated. Plasma etching acts like a fine microtome, continuously removing infinitesimally thin layers at the surface. It has allowed us to observe the internal structure of fibers, and interfiber bonding. The kinetics of plasma etching and its temperature dependence are reported; the thermal activation energy determined from the latter was found to be 0.15 eV. Possible applications of plasma etching techniques to study the structural and physical properites of paper in the z-direction and the distribution of coating material across the thickness of a paper sample are discussed.
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Sapieha, S., Wrobel, A.M. & Wertheimer, M.R. Plasma-assisted etching of paper. Plasma Chem Plasma Process 8, 331–346 (1988). https://doi.org/10.1007/BF01020410
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DOI: https://doi.org/10.1007/BF01020410