Abstract
Structure of epitaxially grown gold films of varying thickness (10–1000Å) has been investigated using LEED, AES, resistivity measurements and X-ray diffraction analysis. Silicon 111-oriented crystals, which are prehandled to exhibit\(\sqrt 3 \times \sqrt 3 R 30^\circ \)-supersctructure in the LEED pattern, serve as substrates. The gold films show a homogeneous structure with smooth surfaces and a marked (111)-orientation. The use of silicon substrates, however, is complicated by the fact, that silicon diffuses through the gold films to a small extent even at room temperature.
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Fischer, W., Geiger, H., Rudolf, P. et al. Structure investigations on single-crystal gold films. Appl. Phys. 13, 245–253 (1977). https://doi.org/10.1007/BF00882888
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DOI: https://doi.org/10.1007/BF00882888