Abstract
Microscopic decomposition processes and gas-solid interactions in CnF2n+2-H2 and CF4-C2F4 discharges are studied by comparing mass-spectrometric results with actinometric emission diagnostics. The role played by CFx radicals is evident in the various processes of gas-phase formation of saturates and unsaturates as well as in the “activation growth mechanism” of polymer deposition.
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d'Agostino, R., De Benedictis, S. & Cramarossa, F. Radiofrequency plasma decomposition of C n F2n+2-H2 and CF4-C2F4 mixtures during Si etching or fluoropolymer deposition. Plasma Chem Plasma Process 4, 1–14 (1984). https://doi.org/10.1007/BF00567367
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DOI: https://doi.org/10.1007/BF00567367