Abstract
The most basic analysis of a chemical vapor deposition reactor goes something like:
“gas in, film out”
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© 2003 Springer Science+Business Media Dordrecht
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Dobkin, D.M., Zuraw, M.K. (2003). Reactors Without Transport. In: Principles of Chemical Vapor Deposition. Springer, Dordrecht. https://doi.org/10.1007/978-94-017-0369-7_2
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DOI: https://doi.org/10.1007/978-94-017-0369-7_2
Publisher Name: Springer, Dordrecht
Print ISBN: 978-90-481-6277-2
Online ISBN: 978-94-017-0369-7
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