Abstract
Thermal loading by irradiating the centre of thin Si3N4-discs with a 150W tungsten lamp is used to perform subcritical crack growth as well as oxidation studies in the temperature regime between 700°C and 1400°C. Crack growth as a function of time is measured in-situ with an optical microscope and evaluated in terms of KI(a)-curves. The result shows clearly a strong decrease in subcritical crack growth at the onset of the oxidation of the glassy phase in Si3N4 due to the formation of viscous bridges between the crack ligaments. The temperature gradients of appr. 500°C in the lateral direction of the disc enable a screening test of the oxidation behaviour of Si3N4 materials at temperatures above 1000°C. Oxidation tests of discs with radial orientated egde cracks show that the crack tip may be shielded by surface oxidation even at temperatures of 1400°C and reveal creep cavitation as the dominant crack growth mechanism.
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References
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© 1994 Springer Science+Business Media New York
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Schneider, G., Nickel, K. (1994). Thermal Loading and Corrosion of Ceramics by Light Irradiation. In: Nickel, K.G. (eds) Corrosion of Advanced Ceramics. NATO Science Series E: (closed), vol 267. Springer, Dordrecht. https://doi.org/10.1007/978-94-011-1182-9_28
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DOI: https://doi.org/10.1007/978-94-011-1182-9_28
Publisher Name: Springer, Dordrecht
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