Prospects

Abstract

In order to judge the prospects of the field of electrocrystallization, it is best to begin with some classification of research in this area. Thus, A. K. Reddy has suggested the following divisions:

• 1. Basic factors, 1–10 Å (atomic level): The work referred to in this monograph as “metal deposition.”⁵¹

• 2. 10–1000 Å (crystallographic level): The work referred to here as “crystal growth.” It takes into account the growth velocities of different crystal faces and the effect of adsorption at growth sites of adventitious impurities (e.g., work on inhibitor effects).^51,55

• 3. 0.1–100 μ (diffusion-layer level): The dependence of growth forms upon local diffusion gradients (e.g., micro-throwing power, theory of leveling).¹⁴⁹

• 4. Laplace-equation level: This research concerns macro-current distribution and, therefore, shape of the deposit, depending on the influence of the local solution resistances and the fraction of the total overpotential which they make up (e.g., theory of throwing power).¹⁶¹