Abstract
Hydrogenated amorphous silicon layers with crystalline nanoparticles have been produced by plasma-enhanced chemical vapor deposition, with tetrafluorosilane added to the gas mixture. The photoluminescence kinetics and photoelectric properties of structures based on these layers have been studied. The structures have a substantial photoresponse efficiency in the visible spectral range, with the position of the photoresponse maximum dependent on the applied bias.
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Original Russian Text © J.S. Vainshtein, O.I. Kon’kov, A.V. Kukin, O.S. El’tsina, L.V. Belyakov, E.I. Terukov, O.M. Sreseli, 2011, published in Fizika i Tekhnika Poluprovodnikov, 2011, Vol. 45, No. 3, pp. 312–315.
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Vainshtein, J.S., Kon’kov, O.I., Kukin, A.V. et al. Specific features of amorphous silicon layers grown by plasma-enhanced chemical vapor deposition with tetrafluorosilane. Semiconductors 45, 302–305 (2011). https://doi.org/10.1134/S1063782611030225
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DOI: https://doi.org/10.1134/S1063782611030225