Abstract
The Response Surface Methodology was employed to optimize the leaching parameters for SiO2 during NaOH alkaline leaching from vanadium acid leaching residues. The kinetic aspect of the process was also investigated. The results illustrate that each factor positively influences the SiO2 leaching rate, with the significance of these factors ranking as follows: leaching temperature > alkali residue mass ratio > leaching duration. Under these optimal circumstances, the SiO2 leaching rate can attain a value as high as 95.55%. A kinetic examination of the alkaline leaching process implies that the reaction process is predominantly governed by internal diffusion. The apparent activation energy of the reaction is 11.92 kJ·mol–1. The kinetic equation is: \(1+2(1-{\mathrm{x}})-3{\left(1-{\mathrm{x}}\right)}^\frac{2}{3}=\mathrm{10.82}{\mathrm{exp}}(-\frac{1192}{RT})t\), and the reaction order of NaOH is 0.7284.
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Acknowledgements to Kunming University of Science and Technology.
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This research was funded by National Natural Science Foundation of China (No. 51964028).
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Xuanxiong Kang: Conceptualization, Validation, Data curation, Formal analysis, Writing- Original draft preparation, Writing- Reviewing and Editing. Guohua Ye: Investigation, Methodology, Project administration, Resources, Supervision, Validation, Writing-review and editing. Siqin Zhu: Validation Yiyang Rong: Resources. Changxu Song: Data curation. Xinyue Xiang: Investigation. Yun Zhang: Visualization.
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Kang, X., Ye, G., Zhu, S. et al. Optimization and Kinetic Analysis of Direct Alkali Leaching of Silica from Vanadium-Bearing Shale Leaching Residue. Silicon 16, 3217–3231 (2024). https://doi.org/10.1007/s12633-024-02916-x
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DOI: https://doi.org/10.1007/s12633-024-02916-x