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This work was supported by KIMM institutional program (NK236F, KN021G) and NST/KIMM. This research was supported by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education (2022R1A3B1078163, 2022R1A4A1031 182). This work was supported by the Technology Innovation Program (20004269, Development of LPC Large Particle Counter for the slurry quality monitoring in CMP process with Raman spectroscopy) funded By the Ministry of Trade, Industry & Energy (MOTIE, Korea).
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The original article can be found online at https://doi.org/10.1007/s12206-023-0218-y.
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Kim, C., Choi, S., Choi, J. et al. Erratum to “Development of a single particle sizing system for monitoring abrasive particles in chemical mechanical polishing process”. J Mech Sci Technol 37, 2131 (2023). https://doi.org/10.1007/s12206-023-0348-2
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DOI: https://doi.org/10.1007/s12206-023-0348-2