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Correction to: Plasma Chemistry and Plasma Processing (2019) 39:1103–1114 https://doi.org/10.1007/s11090-019-09992-7
Unfortunately, the original publication contains errors. The authors would like to correct the errors as given below:
(a) Page 1103, line 9: In the abstract section, “From these densities, the destruction probabilities of the H-atoms on the afterglow quartz tube wall is found to be: \( \gamma_{H}^{He} = \left( {2{-}3} \right) \times 10^{ - 4} \) and \( \gamma_{H}^{Ar} = \left( {3{-}4} \right) \times 10^{ - 3} \)” should read as “From these densities, the destruction probabilities of the H-atoms on the afterglow quartz tube wall are found to be: \( \gamma_{H}^{He} = \left( {2{-}3} \right) \times 10^{ - 3} \) and \( \gamma_{H}^{Ar} = \left( {3{-}4} \right) \times 10^{ - 3} \)”.
(b) Page 1113, line 3: “Using Eq. (8), a global destruction probability of \( \gamma_{H}^{He} = 2.5\left( { \pm 1.0} \right) \times 10^{ - 4} \) is obtained in He/x(N2–5%H2) mixtures” should read as “Using Eq. (8), a global destruction probability of \( \gamma_{H}^{He} = 2.5\left( { \pm 1.0} \right) \times 10^{ - 3} \) is obtained in He/x(N2–5%H2) mixtures”.
(C) Page 1113, line 11: “The \( \gamma_{N}^{{N_{2} }} \) value is thus about one order of magnitude lower than \( \gamma_{H}^{He} \) and two orders of magnitude lower than \( \gamma_{H}^{Ar} \)” should read as “The \( \gamma_{N}^{{N_{2} }} \) value is thus about two orders of magnitude lower than \( \gamma_{H}^{Ar} \) and \( \gamma_{H}^{He} \)”.
(d) Page 1113, line 13: “It is found \( \gamma_{H}^{He} = 2.5\left( { \pm 1.0} \right) \times 10^{ - 4} \) in the He/(2–90)%(N2–5%H2) mixtures, one order of magnitude lower than the \( \gamma_{H}^{Ar} = 4 \times 10^{ - 3} \) value obtained in the Ar/2%(N2–5%H2) mixture” should read as “It is found \( \gamma_{H}^{He} = 2.5\left( { \pm 1.0} \right) \times 10^{ - 3} \) in the He/(2–90)%(N2–5%H2) mixtures and \( \gamma_{H}^{Ar} = 4 \times 10^{ - 3} \) in the Ar/2%(N2–5%H2) mixture”.
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Ricard, A., Sarrette, J.P. Correction to: Densities of Active Species in R/x%(N2–5%H2) (R = Ar or He) Microwave Flowing Afterglows. Plasma Chem Plasma Process 39, 1357 (2019). https://doi.org/10.1007/s11090-019-10010-z
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DOI: https://doi.org/10.1007/s11090-019-10010-z