Abstract
The problems caused by the adhesive force and friction force become more critical when the size of M/NEMS devices shrinks to micro/nano-scale. The nanotexture-patterned surface is an effective approach to reduce friction force on micro/nano-scale. Laser interference lithography is an attractive method to fabricate micro/nanotextures, which is maskless and allows large area periodical structures to be patterned by a couple of seconds’ exposure in a simple equipment system. We fabricate various nanogrooves with different pitch and space width on silicon wafers by laser interference lithography and chemical etching. We investigate the nanotribological properties of the patterned surfaces by AFM/FFM. We show that friction on the nano/micro-scale is related to the coverage rate of the nanogrooves, which decreases with increase in the space width and decrease in the pitch.
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Manuscript submitted by the authors in English first on April 17, 2013 and in final form on April 28, 2013.
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He, H., Yang, H., Zhao, E. et al. Nanotribological properties of silicon surfaces nanopatterned by laser interference lithography. J Russ Laser Res 34, 288–294 (2013). https://doi.org/10.1007/s10946-013-9353-8
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DOI: https://doi.org/10.1007/s10946-013-9353-8