Abstract
Al2O3 thin films fabricated by electron-beam evaporation with ion-assisted deposition at room temperature using O2 or SF6, or their mixture as a working gas were investigated. A significant 20% packing density increase and a low extinction coefficient were obtained when only SF6 was used.
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Chen, YY., Yen, LY., Hsu, JC. et al. Aluminium oxide optical film fabricated with ion-assisted deposition using sulphur hexafluoride and oxygen working gases. OPT REV 18, 293–295 (2011). https://doi.org/10.1007/s10043-011-0057-4
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DOI: https://doi.org/10.1007/s10043-011-0057-4