Abstract.
Fabrication of surface relief-type gratings in transparent dielectrics, which are hard to machine, has been achieved by a holographic technique using two infrared femtosecond (fs) pulses from a mode-locked Ti:sapphire laser. The present method can be applied for a variety of transparent dielectrics, Al2O3 (sapphire), TiO2, ZrO2, LiNbO3, SiC, ZnO, CdF2, MgO, CaF2 crystals, and SiO2 glass. It is found that the grating formation is due primarily to laser ablation processes. Planar surface relief gratings can be fabricated by colliding two fs laser pulses on the surface of substrates which move at a constant speed, synchronized with the laser repetition rate.
Article PDF
Avoid common mistakes on your manuscript.
Author information
Authors and Affiliations
Additional information
Received: 1 March 2000 / Published online: 7 June 2000
Rights and permissions
About this article
Cite this article
Kawamura, K., Ogawa, T., Sarukura, N. et al. Fabrication of surface relief gratings on transparent dielectric materials by two-beam holographic method using infrared femtosecond laser pulses . Appl Phys B 71, 119–121 (2000). https://doi.org/10.1007/s003400000335
Published:
Issue Date:
DOI: https://doi.org/10.1007/s003400000335