Photo-excited processing with relevance to a wide range of applications has increasingly attracted attention due to the unique features of high quality, high efficiency, high flexibility, high resolution, and versatility. This Special Issue of Applied Physics B—Lasers and Optics collects manuscripts invited from presentations presented at 9th International Conference on Photo-Excited Processes and Applications (ICPEPA-9), held from September 29 to October 2, 2014, at Matsue, Japan.

ICPEPA-9 provided a forum for sharing the results of both fundamental research and application-oriented work related to the forefront of the field of photo-excited processing technologies and for exchanging ideas in a relaxing environment. Specifically, the conference topics ranged from the fundamental aspects of laser–material interactions, theory, modeling, dynamics, and diagnostics to applications with cutting, drilling, modification, deposition, synthesis, micro- and nano-structuring, and three-dimensional processing as well as new trends in photo excitations and laser materials processing such as plasmon-enhanced processes and controlled photon-beam processing. The technical program for the 4-day event included 17 invited talks, 49 oral presentations, and 38 poster presentations for a total of 104 contributions from 15 countries.

This Special Issue shares the information on novel achievements in photo-excited processes and applications presented at ICPEPA-9 with a wide readership. Highlights of the selection of manuscripts include plasmon-enhanced nano-processing, nano-material synthesis, vacuum and extreme ultraviolet light applications.