Abstract
Debris mitigation is still a critical issue for the development of extreme ultraviolet projection lithography (EUVL). Here, we describe the analysis of the efficiency of the debris-mitigation system (DMS) presently in use in the laser–plasma–source micro-exposure tool (MET) operating at the Frascati ENEA Research Center. Basic to such an analysis is a code specifically developed for processing the images of debris-flux-exposed glass slides. The code stands out as a tool for further plasma debris-related analyses.
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Bollanti, S., Di Lazzaro, P., Flora, F. et al. Laser–plasma–source debris-related investigations: an aspect of the ENEA micro-exposure tool. Appl. Phys. B 96, 479–490 (2009). https://doi.org/10.1007/s00340-009-3583-z
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DOI: https://doi.org/10.1007/s00340-009-3583-z