Abstract
Micro-cell structures with side-walls as thin as 0.70 μm and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to obtain a much more elongated voxel and an in situ ultraviolet (UV) pre-exposure step to improve the sensitivity of TPA photopolymerization are the main factors responsible for the high aspect ratio and sub-diffraction-limit resolution that are achieved.
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42.70.Gi; 81.05.Lg; 82.35.-x
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Pan, EY., Pu, NW., Tong, YP. et al. Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization. Appl Phys B 77, 485–488 (2003). https://doi.org/10.1007/s00340-003-1283-7
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DOI: https://doi.org/10.1007/s00340-003-1283-7