Abstract
We describe the spectral dynamics of a line-narrowed F2 laser, based on numerical simulation by a newly developed simulation code. The results were compared with the experimental results and it was found that the code could predict well the performance of a line-narrowed operation of the F2 laser. The code was also used to obtain a guideline for the optimized operation of an injection-seeded F2 laser system. In addition, a new spectral narrowing technique for the F2 laser has been proposed and its effectiveness was evaluated by the simulation code.
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S. Nagai, K. Takehisa, T. Enami, T. Nishisaka, J. Fujimoto, O. Wakabayashi, H. Mizoguchi, A. Takahashi: Jpn. J. Appl. Phys. 38, 7013 (1999)
A. Ershov, T. Duffey, E. Onkels, W. Partlo, R. Sandstrom: In 1st Int. Symp. 157 nm Lithography, Dana Point, CA, 2000, private communication
K. Vogler, S. Govorkov, G. Hua, F. Voss, E. Bergmann, U. Stamm, R. Pätzel: In 1st Int. Symp. 157 nm Lithography, Dana Point, CA, 2000, private communication
H. Watanabe, N. Kitatochi, K. Kakizaki, A. Tada, J. Sakuma, K. Hotta: In Proc. Optical Microlithography XIV (SPIE 4346, Santa Clara, CA, 2000) pp. 1074–1079
R. Nohdomi, T. Ariga, H. Watanabe, T. Kumazaki, N. Kitatochi, K. Sasano, Y. Ueno, T. Nishisaka, K. Hotta, H. Mizoguchi, K. Nakao: In 2nd Int. Symp. 157 nm Lithography, Dana Point, CA, 2001, private communication
M. Ohwa, M. Obara: Appl. Phys. Lett. 51, 958 (1987)
M. Kakehata, T. Uematsu, F. Kannari, M. Obara: IEEE J. Quantum Electron. QE-27, 2456 (1991)
M. Diegelmann, K. Hohla, F. Rebentrost, K.L. Kompa: J. Chem. Phys. 76, 1233 (1982)
C. Skordoulis, S. Spyrou, A.C. Cefalas: Appl. Phys. B 15, 141 (1990)
M. Maeda, A. Takahashi, T. Mizunami, Y. Miyazoe: Jpn. J. Appl. Phys. 21, 1161 (1982)
T. Ariga, H. Watanabe, T. Kumazaki, N. Kitatochi, K. Sasano, Y. Ueno, M. Konishi, M. Nakano, T. Yamashita, T. Nishisaka, R. Nohdomi, K. Hotta, H. Mizoguchi, K. Nakao: In Proc. Optical Microlithography XV (SPIE 4691, Santa Clara, CA, 2002) pp. 652–659
T. Ariga, R. Nohdomi, K. Hotta: Jpn. J. Appl. Phys., to be published (private communication)
J. Fujimoto, T. Takehisa, T. Suzuki, S. Nagai, T. Yabu, G. Soumagne, T. Chiba, O. Wakabayashi, H. Mizoguchi: In 2nd Int. Symp. 157 nm Lithography, Dana Point, CA, 2001, private communication
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42.55.Lt; 42.60.By; 42.60.Fc; 33.20.Ni; 78.20.Bh
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Tanaka, H., Takahashi, A., Okada, T. et al. Spectral dynamics of narrow-band F2 laser for optical lithography. Appl Phys B 76, 735–740 (2003). https://doi.org/10.1007/s00340-003-1155-1
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DOI: https://doi.org/10.1007/s00340-003-1155-1