Abstract
Chemical-mechanical polishing (CMP) is a key process in the fabrication of high-precision large-aperture plane optics. To satisfy the growing demand for better polishing efficiency and accuracy in CMP process, there is a new focus on the development of a new CMP machine that applies high-precision motion parts including ultra-precision spindles, guideways, rotary table, and numerical control system. In this article, to show how the run-out error of a rotary table affects the polishing efficiency and accuracy, we propose a material-removing model that creatively analyzes the material-removing process at any point N on a workpiece. To verify the model, we performed a variety of analysis and polishing experiments using the KPJ1700 and KPJ1200 CMP machine. For 6-h-long polishing process on the KPJ1700 CMP machine, the surface accuracy of the 400 × 80 mm UBK7 optic varies from 10.51 to 2.94 λ, and then to 0.32 λ after another 4 h. For 6-h-long polishing process on the KPJ1200 CMP machine, the surface accuracy of the 430 × 430 mm UBK7 optic varies from 5.78 to 3.48 λ, and then to 0.8 λ after another 4 h. The measurement results proved that a smaller run-out error results in higher polishing efficiency and accuracy.
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Li B, Zhao HY, Xi JP (2015) On-machine self-calibration method for compensation during precision fabrication of 900-mm-diameter zerodur aspheric mirror. Int J Adv Manuf Technol 76(9):1855–1863
Xi JP, Zhao HY, Li B (2016) Profile error compensation in cross-grinding mode for large-diameter aspheric mirrors. Int J Adv Manuf Technol 83(9):1–9
Tonnellier X (2009) Precision grinding for rapid manufacturing of large optics. Cranfield University
Yeh HM, Chen KS (2010) Development of a pad conditioning simulation module with a diamond dresser for CMP applications. Int J Adv Manuf Technol 50(1):1–12
Pal RK, Garg H, Karar V (2016) Full aperture optical polishing process: overview and challenges[M]//CAD/CAM, robotics and factories of the future. Springer, India
Zhao D, Lu X (2013) Chemical mechanical polishing: theory and experiment. Friction 1(4):306–326
Dornfeld D, Lee DE (2008) Precision manufacturing. Springer, US
Mekid S (2015) Introduction to precision machine design and error assessment. CRC Press, Taylor & Francis, Boca Raton
Huang N, Zhang S, Bi Q (2016) Identification of geometric errors of rotary axes on 5-axis machine tools by on-machine measurement. Int J Adv Manuf Technol 84(1):505–512
Lee KI, Yang SH (2016) Compensation of position-independent and position-dependent geometric errors in the rotary axes of five-axis machine tools with a tilting rotary table. Int J Adv Manuf Technol 85(5):1677–1685
Tian F, Li Z, Lv C (2016) Polishing pressure investigations of robot automatic polishing on curved surfaces. Int J Adv Manuf Technol 87(1–4):1–8
Preston F, W. (1927) The theory and design of plate glass polishing machine. J Soc Glas Technol 11(44):214–256
Marinescu ID, Uhlmann E, Doi T (2007) Handbook of lapping and polishing. CRC
Zarudi I, Zhang LC (2000) On the limit of surface integrity of alumina by ductile-mode grinding. J Eng Mater Technol 122(1):129–134
Ye SW, Yang P, Peng YF (2016) Three-dimensional profile stitching measurement for large aspheric surface during grinding process with sub-micron accuracy. J Precis Eng 47:62–71
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Zhang, C.P., Zhao, H.Y., Xie, R.Q. et al. Effect of motion accuracy on material removal during the CMP process for large-aperture plane optics. Int J Adv Manuf Technol 94, 105–119 (2018). https://doi.org/10.1007/s00170-017-0857-1
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DOI: https://doi.org/10.1007/s00170-017-0857-1