Abstract
A cluster magnetorheological (MR) plane polishing based on a combination of magnetorheological finishing (MRF) and cluster mechanism (arrange in a regular array) has been developed for large planar optical workpiece. In this paper, the polishing pressure of an individual MR micro-grinding head on workpieces was investigated, and the mathematical model for cluster MR plane polishing was established based on the Preston equation and the properties of the workpiece material. An arc-shaped polishing belt was processed on monocrystalline 6H-SiC and Si wafer by the cluster MR polishing apparatus which polishing disk inlaid with cylindrical flat bottom magnetic pole arrange in the same direction regularly and monocyclically. The profile of arc polishing belt’s cross section and the surface morphology were observed and analysed to verify the obtained model. The abrasives with different size were found to have an equal effect on the processed surface because of the accommodated-sinking effect of the polishing pad constituted by the cluster MR micro-grinding head. It was found that the monocrystalline 6H-SiC and Si wafer were polished in a plastic mode with a smooth, damage-free surface.
Article PDF
Similar content being viewed by others
Avoid common mistakes on your manuscript.
References
Kordonski W, Gorodkin S (2011) Material removal in magnetorheological finishing of optics. Appl Optics 50(14):1984–1994. doi:10.1364/AO.50.001984
Miao C, Lambropoulos JC, Jacobs SD (2010) Process parameter effects on material removal in magnetorheological finishing of borosilicate glass. Appl Optics 49:1951–1963. doi:10.1364/AO.49.001951
Sidpara A, Jain VK (2012) Theoretical analysis of forces in magnetorheological fluid based finishing process. Int J Mech Sci 56(1):50–59. doi:10.1016/j.ijmecsci.2012.01.001
Sidpara A, Jain VK (2013) Analysis of forces on the freeform surface in magnetorheological fluid based finishing process. Int J Mach Tool Manu 69:1–10. doi:10.1016/j.ijmachtools.2013.02.004
Sidpara A, Jain VK (2011) Experimental investigations into forces during magnetorheological fluid based finishing process. Int J Mach Tool Manu 51(4):358–362. doi:10.1016/j.ijmachtools.2010.12.002
Sidpara A, Jain VK (2012) Nano level finishing of single crystal silicon blank using MRF process. Tribol Int 47:159–166. doi:10.1016/j.triboint.2011.10.008
Li YM, Shen XQ, Wang AL (2009) Nano-precision finishing technology based on magnetorheological finishing. Key Eng Mater 416:118–122. doi:10.4028/www.scientific.net/KEM.416.118
Degroote JE (2007)Surface interactions between nanodiamonds and glass in magnetorheological finishing (MRF). Dissertation, University of Rochester
Yin SH, Wang YQ, Deng GJ, Luo H, Chen FJ, Lu ZC (2013) Effects of permanent magnet excitation on material removal rate in area taking magnetorhelogical finishing. Adv Mater Res 2631(797):401–404. doi:10.4028/www.scientific.net/AMR.797.401
Shorey AB (2000) Mechanisms of material removal in magnetorheological finishing (MRF) of glass. Dissertation, University of Rochester
Niranjan M, Jha S, Kotnala RK (2014) Ball end magnetorheological finishing using bidisperse magnetorheological polishing fluid. Mater Manuf Process 29(4):487–492. doi:10.1080/10426914.2014.892609
Niranjan M, Jha S, Kotnala RK (2013) Mechanism of material removal in ball end magnetorheological finishing process. Wear 302(1–2):1180–1191. doi:10.1016/j.wear.2012.11.082
Jha S, Jain VK, Komanduri R (2007) Effect of extrusion pressure and number of finishing cycles on surface roughness in magnetorheological abrasive flow finishing (MRAFF) process. Int J Adv Manuf Techno 33(7):725–729. doi:10.1007/s00170-006-0502-x
Das M, Jain VK, Ghoshdastidar PS (2008) Analysis of magnetorheological abrasive flow finishing (MRAFF) process. Int J Adv Manuf Techno 38(5):613–621. doi:10.1007/s00170-007-1095-8
Guo HR, Wu YB, Lu D, Fujimoto M, Nomura M (2014) Effects of pressure and shear stress on material removal rate in ultra-fine polishing of optical glass with magnetic compound fluid slurry. J Mater Process Tech 214(11):2759–2769. doi:10.1016/j.jmatprotec.2014.06.014
Shimada K, Wu YB, Wong YC (2003) Effect of magnetic cluster and magnetic field on polishing using magnetic compound fluid (MCF). J Magn Magn Mater 262(2):242–247. doi:10.1016/S0304-8853(02)01497-X
Pan JS, Yan QS, Lu JB, Xu XP, Chen CK (2014) Cluster magnetorheological effect plane polishing technology. J Mech Eng 50(01):205–212. doi:10.3901/JME.2014.01.205
Pan JS, Yan QS, Xu XP, Tong HP, Zhu JT, Bai ZW (2013) Custer magnetorheological effect plane polishing on SiC single crystal slice. China Mech Eng 24(18):2495–2499. doi:10.3969/j.issn.1004-132X.2013.18.016
Wu ZC, Yan QS, Bai ZW, Kong LY, Chai JF (2011) Ultra smooth polishing research based on the cluster magnetorheological effect. Key Eng Mater 487:283–288. doi:10.4028/www.scientific.net/KEM.487.283
Yan QS, Gao WQ and Lu JB(2009) Grinding polishing method based on magnetic rheology effect and its polishing device. Patent, CN200610132495.9
Yang Y, Yan QS, Lu JB, Liu Y, Gao WQ (2009) Research on plane polishing using instantaneous tiny grinding wheel based on magnetorheological effect. Mach Tool & Hydra 37(12):5–7. doi:10.3969/j.issn.1001-3881.2009.12.002, 14
Yi CJ (2011)Magnetorheological fluids: preparation, property and modeling. Dissertation, Chongqing University
Jha S, Jain VK (2006) Modeling and simulation of surface roughness in magnetorheological abrasive flow finishing (MRAFF) process. Wear 261:856–866. doi:10.1016/j.wear.2006.01.043
Luo JF (2011) Material removal mechanism in chemical mechanical polishing: theory and modeling. IEEE T SEMICONDUCT M 14(2):112–133. doi:10.1109/66.920723
Buijs M, Houten KKV (1993) Three-body abrasion of brittle materials as studied by lapping. Wear 166(2):237–245. doi:10.1016/0043-1648(93)90267-P
Buijs M, Houten KK-V (1993) A model for lapping of glass. J Mater Sci & Tech 28(11):3014–3020. doi:10.1007/BF00354706
Zhang F, Zhang XJ, Yu JC, Wang QT, Guo PJ (2000) Foundation of mathematics model of MR finishing. Optical Tech 26(02):190–192. doi:10.13741/j.cnki.11-1879/o4.2000.02.032
Yang PR (1998) Numerical analysis of fluid lubrication. Yang PR, Beijing
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Pan, J., Yan, Q. Material removal mechanism of cluster magnetorheological effect in plane polishing. Int J Adv Manuf Technol 81, 2017–2026 (2015). https://doi.org/10.1007/s00170-015-7332-7
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s00170-015-7332-7