Abstract
Thin molybdenum disilicide (MoSi2) films have been produced by magnetron sputter deposition, and subjected to oxidation tests for the study of “MoSi2 pest”-a phenomenon showing disintegration of a solid piece of MoSi2 into powdery products. The as-prepared films were of an amorphous structure. Oxidation of the films in air at 500° C led first to cracking of the films, and then the cracked pieces eventually evolved into disintegrated powders with a yellowish appearance. Secondary electron microscopy and Auger electron spectroscopy revealed that the reaction products consisted of MoO3 whiskers (platelets), Si-Mo-O fibres, SiO2 clusters, and some residual MoSi2. The disintegration of MoSi2 films appeared to be independent of their crystal structure; a similar phenomenon was also observed in crystallized films, with a metastable hexagonal structure, oxidized under the same conditions. The disintegration of the MoSi2 films is compared to and correlated with the “pest reaction” of bulk MoSi2.
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References
Von E. Fitzer, in “Plansee Proceedings, 2nd Seminar” (Reutte/Tyrol, 1956) pp. 56–79.
C. D. Wirkus andD. R. Wilder,J. Am. Ceram. Soc. 49 (1966) 173.
H. H. Hausner (ed.), “Coatings of High Temperature Materials” (Plenum, New York, 1966).
G. V. Samsonov, “Silicides and Their Uses in Engineering” (Akad. Nauk. Ukr. SSR, Kiev, 1959).
A. Guivarc'h, P. Auvray, L. Le Cun, J. P. Boulet, G. Pelous andA. Martinez,J. Appl. Phys. 49 (1978) 233.
A. Perio, J. Torres, G. Bomchil, F. Arnaud D'Avitaya andR. Pantel,Appl. Phys. Lett. 45 (1984) 857.
S. P. Murarka, “Silicides for VLSI Applications” (Academic Press, New York, 1983).
F. M. D'Heurle, C. S. Petersson andM. Y. Tsai,J. Appl. Phys. 51 (1980) 5976.
J. J. Rausch, ARF 2981-4, Armour Research Foundation, 31 August 1961, NSA 15-31171.
E. A. Aitken, in “Intermetallic Compounds”, edited by J. H. Westbrook (Wiley, New York, 1967) pp. 491–516.
P. J. Meschter,Met. Trans. 23A (1992) 1763.
T. C. Chou andT. G. Nieh,Scripta Metall. Mater. 26 (1992) 1637.
Idem, ibid. 27 (1992) 19.
Idem, J. Mater. Res. 8 (1993) 214.
J. H. Westbrook andD. L. Wood,J. Nucl. Mater. 12 (1964) 208.
C. H. Ho, S. Prakash, H. J. Doerr, C. V. Deshpandey andR. F. Bunshah,Thin Solid Films 207 (1992) 294.
A. L. Pranatis, C. I. Whitman andC. D. Dickinson, “Summary of the 5th Meeting of the Refractory Composites Working Group”, Defense Metals Information Center Report 167, March 1962.
R. A. Perkins, private communication (1992).
T. C. Chou andT. G. Nieh,Thin Solid Films 214 (1992) 48.
A. B. Gokhale andG. J. Abbaaschian, in “Binary Alloy Phase Diagrams”, Vol. 1, edited by T. B. Massalski, J. L. Murray, L. H. Bennett and H. Baker (ASM, Metals Park, OH, 1986) p. 1632.
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Chou, T.C., Nieh, T.G. Pest disintegration of thin MoSi2 films by oxidation at 500° C. J Mater Sci 29, 2963–2967 (1994). https://doi.org/10.1007/BF01117608
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DOI: https://doi.org/10.1007/BF01117608