Abstract
Maskless etching of Mn-Zn ferrite in dichlorodifluoromethane (CCl2F2) by Ar+-ion laser (514.5 nm line) irradiation has been investigated to obtain high etching rates and aspect-ratio of etched grooves. The etching reaction was found to be thermochemical. High etching rates of up to 360 μm/s, which is about one order of magnitude higher than that in a CCl4 gas atmosphere and even higher than that in a H3PO4 solution, have been achieved. A maximum aspect-ratio of 6.9 was obtained.
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References
R.M. Osgood, Jr., S.R.J. Brueck, H.R. Schlossberg (eds.): Laser Diagnostics and Photochemical Processing for Semiconductors (North-Holland, Amsterdam 1983)
A.W. Johnson, D.J. Ehrlich, H.R. Schlossberg (eds.): Laser-Controlled Chemical Processing of Surface (North-Holland, Amsterdam 1984)
D. Bäuerle (ed.): Laser Processing and Diagnostics, Springer Ser. Chem. Phys. 39 (Springer, Berlin, Heidelberg 1984)
D.J. Ehrlich, J.Y. Tsao (eds.): Laser Microfabrication — Thin Film Processes and Lithography (Academic, San Diego 1989)
M. Takai, S. Nagatomo, T. Koizumi, Y.F. Lu, K. Gamo, S. Namba: In Laser Processing and Diagnostics (II), ed. by D. Bäuerle, K.L. Kompa, L. Lande (Les Editions de Physique, Paris 1986) p. 57
M. Takai, Y.F. Lu, T. Koizumi, S. Nagatomo, S. Namba: Appl. Phys. A 46, 197 (1988)
Y.F. Lu, M. Takai, S. Nagatomo, S. Namba: Appl. Phys. A 47, 319 (1988)
Y.F. Lu, M. Takai, S. Nagatomo, T. Minamisono, S. Namba: Jpn. J. Appl. Phys. 28, 2151 (1989)
Y.F. Lu, M. Takai, A. Kinomura, H. Sanda, S. Namba: Submitted to Lasers in Materials Engineering
CCl2F2: DFG MAK: 1000 ppm (4950 mg/m3), CCl4: DFG MAK: 10 ppm (65 mg/m3): referenced from Hazardous Chemicals Desk Reference: ed. by N.I. Sax, R.J. Lewis, Sr. (Van Nostrond Reinhold, New York, Tokyo 1987), Japanese Edition p. 260 and p. 247
Comprehensive Inorganic Chemistry, Vol. 2, ed. by J.C. Bailar, Jr., H.J. Emeleus, R. Nyholm, A.F. Trotman-Dikenson (Pergamon, Oxford 1973) p. 1258
J. Tokuda, M. Takai, K. Gamo, S. Namba: Inst. Phys. Conf. Ser. 79, 319 (IOP, Bristol 1986)
M. Takai, J. Tokuda, N. Nakai, K. Gamo, S. Namba: Jpn. J. Appl. Phys. 22, L 757 (1983)