Abstract
Nanoscale copper (I) oxide layers are formed by magnetron-assisted sputtering onto glassy and silicon substrates in an oxygen-free environment at room temperature, and the structural and optical properties of the layers are studied. It is shown that copper oxide formed on a silicon substrate exhibits a lower degree of disorder than that formed on a glassy substrate, which is supported by the observation of a higher intensity and a smaller half-width of reflections in the diffraction pattern. The highest intensity of reflections in the diffraction pattern is observed for Cu2O films grown on silicon at a magnetron power of 150 W. The absorption and transmittance spectra of these Cu2O films are in agreement with the well-known spectra of bulk crystals. In the Raman spectra of the films, phonons inherent in the crystal lattice of cubic Cu2O crystals are identified.
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Original Russian Text © D.A. Kudryashov, A.S. Gudovskikh, A.V. Babichev, A.V. Filimonov, A.M. Mozharov, V.F. Agekyan, E.V. Borisov, A.Yu. Serov, N.G. Filosofov, 2017, published in Fizika i Tekhnika Poluprovodnikov, 2017, Vol. 51, No. 1, pp. 111–115.
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Kudryashov, D.A., Gudovskikh, A.S., Babichev, A.V. et al. Nanoscale Cu2O films: Radio-frequency magnetron sputtering and structural and optical studies. Semiconductors 51, 110–114 (2017). https://doi.org/10.1134/S1063782617010110
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DOI: https://doi.org/10.1134/S1063782617010110