Abstract
The surface morphology and structure of (0001) sapphire substrates subjected to thermochemical nitridation in a mixture of N2, СО, and Н2 gases are investigated by electron and probe microscopy and X-ray and electron diffraction. It is shown that an aluminum nitride layer is formed on the substrate surface and heteroepitaxial ZnO films deposited onto such substrates by magnetron sputtering have a higher quality when compared with films grown on sapphire.
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Original Russian Text © A.V. Butashin, V.M. Kanevsky, A.E. Muslimov, P.A. Prosekov, O.A. Kondratev, A.E. Blagov, A.L. Vasil’ev, E.V. Rakova, V.A. Babaev, A.M. Ismailov, E.A. Vovk, S.V. Nizhankovsky, 2015, published in Kristallografiya, 2015, Vol. 60, No. 4, pp. 620–624.
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Butashin, A.V., Kanevsky, V.M., Muslimov, A.E. et al. Growth of crystalline ZnO films on the nitridated (0001) sapphire surface. Crystallogr. Rep. 60, 565–569 (2015). https://doi.org/10.1134/S1063774515040094
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DOI: https://doi.org/10.1134/S1063774515040094