Abstract
Textured polycrystalline aluminum nitride films are grown on a silica substrate by chemical vapor deposition using metallic aluminum and ammonium chloride as the initial reagents. The good texture and crystal quality of the prepared films are confirmed by raster electron microscopy, Raman spectroscopy, and X-ray diffraction.
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Original Russian Text © A.N. Red’kin, M.V. Ryzhova, E.E. Yakimov, D.V. Roshchupkin, 2017, published in Mikroelektronika, 2017, Vol. 46, No. 1, pp. 30–33.
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Red’kin, A.N., Ryzhova, M.V., Yakimov, E.E. et al. Investigation of textured aluminum nitride films prepared by chemical vapor deposition. Russ Microelectron 46, 26–29 (2017). https://doi.org/10.1134/S1063739717010085
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DOI: https://doi.org/10.1134/S1063739717010085