Abstract
Ion-implanted Ni, Fe, and Co layers in silicon are experimentally investigated. It is established that at certain heat-treatment conditions and irradiation doses so-called epitaxial silicides form on the single-crystal surface, which can work as conductive layers or metal coatings.
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Original Russian Text © B.E. Egamberdiev, N.T. Rustamov, A.S. Mallaev, A.M. Norov, 2015, published in Poverkhnost’. Rentgenovskie, Sinkhrotronnye i Neitronnye Issledovaniya, 2015, No. 6, pp. 69–73.
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Egamberdiev, B.E., Rustamov, N.T., Mallaev, A.S. et al. Effect of annealing on the crystal structure of the surface of silicon doped with Ni, Fe, and Co ions. J. Surf. Investig. 9, 612–615 (2015). https://doi.org/10.1134/S1027451015030222
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DOI: https://doi.org/10.1134/S1027451015030222