Abstract
Structural and photoluminescent properties of TiN thin films deposited by dc reactive magnetron sputtering are studied. It is found that TiN thin films are polycrystalline with a grain size of ∼15 nm and have a NaCl-type cubic crystal structure with a lattice constant of 0.42 nm. The TiN films under study exhibit photoluminescence in the spectral range h ν ≈ 2.1–3.4 eV at 300 K.
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Original Russian Text © M.N. Solovan, V.V. Brus, P.D. Maryanchuk, I.M. Fodchuk, V.M. Lorents, A.M. Sletov, M.M. Sletov, M. Gluba, 2014, published in Optika i Spektroskopiya, 2014, Vol. 117, No. 5, pp. 775–778.
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Solovan, M.N., Brus, V.V., Maryanchuk, P.D. et al. Structural and photoluminescent properties of TiN thin films. Opt. Spectrosc. 117, 753–755 (2014). https://doi.org/10.1134/S0030400X14110198
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DOI: https://doi.org/10.1134/S0030400X14110198