Abstract
TCAD Simulations for 30 nm double gate tunnel field effect transistor (DGTFET) reports steeper subthreshold swing, SS ~ 15 mV/dec, ION ~ 10–4 A/µm, and low off-state current IOFF ~ 10−15A/µm as desirable parameters for low voltage applications. The unity gain frequency (fT) increases with Vgs and maximizes at 5.2 × 1011 Hz for Vgs = Vds = 0.7 V. It is investigated that the gain-bandwidth product (GBP) also increase with Vgs and maximized at 2.63 × 1011 Hz for Vds = 0.7 V at Vgs = 0.6 V. Transconductance frequency product (TFP) increases initially with Vgs (0–0.7 V) and maximizes at 4.46 × 1011 Hz/V for Vds = 0.7 V. Higher value of Vds results in better response time of the DGTFETs, i.e., increasing Vds from 0.1 to 0.8 V, the transit time (tr) of the electron decreases from 4 to 0.1 ps resulting faster switching operation. Transient performance of DGTFETs reports that at supply voltage (VDD) = 0.7 V, increasing the load capacitance (CL, 10–200 pF) the total delay increases from 0.18 to 1.9 ns. It is also noticed that the % peak voltage overshoot (% Vp) decreases from 42.8 to 2.14% due to decrease in computed values of miller capacitance (CMIL) from 11.27 to 4.32 fF. Maintaining CL = 15 fF, increasing VDD reports significant variation in voltage peak overshoot from 35 to 26.25% and total delay also decreases from 8 to 0.2 ns for VDD = 0.1–0.8 V.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Similar content being viewed by others
References
Baravelli, E., Gnani, E., Gnudi, A., Reggiani, S., Baccarani, G.: TFET inverters with n-/p-devices on the same technology platform for low-voltage/low-power applications. IEEE Trans. Electron Devices 61(2), 473–478 (2014)
Nikonov, D.E., Young, I.A.: Overview of beyond-CMOS devices and a uniform methodology for their benchmarking. Proc. IEEE 101(12), 2498–2533 (2013)
Nikonov, D.E., Young, I.A.: Benchmarking of beyond-CMOS exploratory devices for logic integrated circuits. IEEE J. Explor. Solid-State Comput. Devices Circuits 1, 3–11 (2015)
Pan, C., Naeemi, A.: An expanded benchmarking of beyond-CMOS devices based on Boolean and neuromorphic representative circuits. IEEE J. Explor. Solid-State Comput. Devices Circuits 3, 101–110 (2017)
Lu, H., Paletti, P., Li, W., Fay, P., Ytterdal, T., Seabaugh, A.: Tunnel FET analog benchmarking and circuit design. IEEE J. Explor. Solid-State Comput. Devices Circuits 4(1), 19–25 (2018)
Guenifi, N., Rahi, S.B., Ghodbane, T.: Rigorous study of double gate tunneling field effect transistor structure based on silicon. Mater. Focus. 7(6), 866–872 (2018)
Kumar, D.: Performance evaluation of double gate tunnel FET based chain of inverters and 6-T SRAM cell. Eng. Res. Express. 1(2), 025055 (2019)
Chen, S., Liu, H., Wang, S., Li, W., Wang, X., Zhao, L.: Analog/RF performance of T-shape gate dual-source tunnel field-effect transistor. Nanoscale Res. Lett. 13(1), 321 (2018)
Der Agopian, P.G., Martino, J.A., Vandooren, A., Rooyackers, R., Simoen, E., Thean, A., Claeys, C.: Study of line-TFET analog performance comparing with other TFET and MOSFET architectures. Solid-State Electron. 128, 43–47 (2017)
Baravelli, E., Gnani, E., Gnudi, A., Reggiani, S., Baccarani, G.: TFET inverters with n-/p-devices on the same technology platform for low-voltage/low-power applications. IEEE Trans. Electron Devices 61(2), 473–478 (2014)
Khatami, Y., Banerjee, K.: Steep subthreshold slope n-and p-type tunnel-FET devices for low-power and energy-efficient digital circuits. IEEE Trans. Electron Devices 56(11), 2752–2761 (2009)
Zhuge, J., Verhulst, A.S., Vandenberghe, W.G., Dehaene, W., Huang, R., Wang, Y., Groeseneken, G.: Digital-circuit analysis of short-gate tunnel FETs for low-voltage applications. Semicond. Sci. Technol. 26(8), 085001 (2011)
Bizindavyi, J., Verhulst, A.S., Verreck, D., Sorée, B., Groeseneken, G.: Large Variation in Temperature Dependence of Band-to-Band Tunneling Current in Tunnel Devices. IEEE Electron Device Lett. 40(11), 1864–1867 (2019)
Wu, P., Appenzeller, J.: Reconfigurable black phosphorus vertical tunneling field-effect transistor with record high on-currents. IEEE Electron Device Lett. 40(6), 981–984 (2019)
Verhulst, A.S., Vandenberghe, W.G., Maex, K., De Gendt, S., Heyns, M.M. and Groeseneken, G.: Complementary silicon-based heterostructure tunnel-FETs with high tunnel rates. IEEE Electron Device Lett. 29(12), 398–1401 (2008)
Kim, S.W., Choi, W.Y., Sun, M.C., Kim, H.W. and Park, B.G.: Design guideline of Si-based L-shaped tunneling field-effect transistors. Jpn. J. Appl. Phys., 51(6S), 06FE09 (2012)
Mookerjea, S., Datta, S.: Comparative study of Si, Ge and InAs based steep subthreshold slope tunnel transistors for 0.25 V supply voltage logic applications. In: 2008 Device Research Conference, pp. 47–48. IEEE (2008)
Gandhi, R., Chen, Z., Singh, N., Banerjee, K., Lee, S.: Vertical Si-Nanowire $ n $-Type Tunneling FETs With Low Subthreshold Swing ($\leq\hbox {50}\\hbox mV/decade $) at Room Temperature. IEEE Electron Device Lett. 32(4), 437–439 (2011)
Asthana, P.K., Goswami, Y., Basak, S., Rahi, S.B., Ghosh, B.: Improved performance of a junctionless tunnel field effect transistor with a Si and SiGe heterostructure for ultra low power applications. RSC Adv. 5(60), 48779–48785 (2015)
Luo, Z., Wang, H., An, N., Zhu, Z.: A tunnel dielectric-based tunnel FET. IEEE Electron Device Lett. 36(9), 966–968 (2015)
Rahi, S.B., Bahniman, G.: High-k Double Gate Junctionless Tunnel FET with Tunable Bandgap. RSC Adv. 5(67), 54544–54550 (2015) (Impact factor: 3.049). https://doi.org/10.1039/C5RA06954H
Rahi, S.B., Asthana, P. Gupta, S.: Heterogate junctionless tunnel field-effect transistor: future of low-power devices. J. Comput. Electron. 16(1), 30–38 (2017) (Impact factor: 1.637). https://doi.org/10.1007/s10825-016-0936-9
Wang, X., Tang, Z., Cao, L., Li, J., Liu, Y.: Gate Field plate structure for subthreshold swing improvement of Si line-tunneling FETs. IEEE Access 7, 100675–100683 (2019)
Lu, H., Paletti, P., Li, W., Fay, P., Ytterdal, T. and Seabaugh, A.: Tunnel FET analog benchmarking and circuit design. IEEE J. Explor. Solid-State Comput. Devices Circuits 4(1), 19–25 (2018)
Strangio, S., Settino, F., Palestri, P., Lanuzza, M., Crupi, F., Esseni, D., Selmi, L.: Digital and analog TFET circuits: design and benchmark. Solid-State Electron. 146, 50–65 (2018)
Kim, M.S., Liu, H., Li, X., Datta, S., Narayanan, V.: A steep-slope tunnel FET based SAR analog-to-digital converter. IEEE Trans. Electron Devices 61(11), 3661–3667 (2014)
Elnaggar, M., Shaker, A., Fedawy, M.: Modified hetero-gate-dielectric TFET for improved analog and digital performance. In: 2018 13th International Conference on Computer Engineering and Systems (ICCES), pp. 683–687. IEEE (2018)
Imenabadi, R.M., Saremi, M., Vandenberghe, W.G.: A novel PNPN-like Z-shaped tunnel field-effect transistor with improved ambipolar behavior and RF performance. IEEE Trans. Electron Devices 64(11), 4752–4758 (2017)
Asra, R., Shrivastava, M., Murali, K.V., Pandey, R.K., Gossner, H., Rao, V.R.: A tunnel FET for $ V_ {DD} $ scaling below 0.6 V with a CMOS-comparable performance. IEEE Trans. Electron Devicesv 58(7), 1855–1863 (2011)
Datta, S., Liu, H., Narayanan, V.: Tunnel FET technology: a reliability perspective. Microelectron. Reliab. 54(5), 861–874 (2014)
Choi, W.Y., Park, B.G., Lee, J.D., Liu, T.J.K.: Tunneling field-effect transistors (TFETs) with subthreshold swing (SS) less than 60 mV/dec. IEEE Electron Device Lett. 28(8), 743–745 (2007). https://doi.org/10.1109/LED.2007.901273
Ionescu, A.M., Riel, H.: Tunnel field-effect transistor as energy-efficient electronic switches. Nature 479(7373), 329–337 (2011). https://doi.org/10.1038/nature10679
Mookerjea, S., Krishnan, R., Datta, S., Narayanan, V.: Effective capacitance and drive current for tunnel FET (TFET) CV/I estimation. IEEE Trans. Electron Devices 56(9), 2092–2098 (2009)
Nirschl, T., Wang, P.F., Weber, C., Sedlmeir, J., Heinrich, R., Kakoschke, R., Schrufer, K., Holz, J., Pacha, C., Schulz, T., Ostermayr, M.: The tunneling field effect transistor (TFET) as an add-on for ultra-low-voltage analog and digital processes. In: IEDM Technical Digest. IEEE International Electron Devices Meeting, pp. 195–198. IEEE (2004)
Kumar, D., Jain, P.: Performance of dual metal-double gate tunnel field effect transistor with different dielectrics. In: Proceeding of International Conference on Intelligent Communication, Control and Devices 2017, pp. 927–933. Springer, Singapore
Mallik, A., Chattopadhyay, A.: Drain-dependence of tunnel field-effect transistor characteristics: the role of the channel. IEEE Trans. Electron Devices 58(12), 4250–4257 (2011)
Xing, H.G., Zhou, G., Li, M., Lu, Y., Li, R., Wistey, M., Fay, P., Jena, D., Seabaugh, A.: Tunnel FETs with tunneling normal to the gate. In: 2013 Third Berkeley Symposium on Energy Efficient Electronic Systems (E3S), pp. 1–1. IEEE (2013)
Sedighi, B., Hu, X.S., Liu, H., Nahas, J.J., Niemier, M.: Analog circuit design using tunnel-FETs. IEEE Trans. Circuits Syst. I Regul. Pap. 62(1), 39–48 (2014)
Narang R, Saxena M, Gupta RS, Gupta M. Device and circuit level performance comparison of tunnel FET architectures and impact of heterogeneous gate dielectric. JSTS: J. Semicond. Technol. Sci. 13(3), 22436 (2013)
Saripalli, V., Datta, S., Narayanan, V., Kulkarni, J.P.: Variation-tolerant ultra low-power heterojunction tunnel FET SRAM design. In: Proceedings of the 2011 IEEE/ACM International Symposium on Nanoscale Architectures, 2011 Jun 8, pp. 45–52. IEEE Computer Society (2011)
Lee, Y, Kim, D., Cai, J., Lauer, I., Chang, L., Koester, S.J., Blaauw, D., Sylvester, D.: Low-power circuit analysis and designbased on heterojunction tunneling transistors (HETTs). IEEE Trans. Very Large Scale Integr. (VLSI) Syst. 21(9), 1632–1643 (2013)
Avci, U.E., Morris, D.H., Hasan, S., Kotlyar, R., Kim, R., Rios, R., Nikonov, D.E., Young, I.A.: Energy efficiency comparison of nanowire heterojunction TFET and Si MOSFET at Lg = 13nm, including P-TFET and variation considerations. In: 2013 IEEE International Electron Devices Meeting, 2013 Dec 9, pp. 33–4. IEEE (2013)
Trivedi, A.R., Carlo, S., Mukhopadhyay, S.: Exploring tunnel-FET for ultra low power analog applications: a case study on operational transconductance amplifier. In: Proceedings of the 50th Annual Design Automation Conference, 2013 May 29, p. 109. ACM (2013)
Raghav, N., Bansal, M.: Analysis of power efficient 6-T SRAM cell with performance measurements. In: 2017 International Conference on Innovations in Control, Communication and Information Systems (ICICCI), 2017 Aug 12, pp. 1–4. IEEE (2017)
Palomo, F.R., Fernández-Martínez, P., Mogollón, J.M., Hidalgo, S., Aguirre, M.A., Flores, D., López-Calle, I., de Agapito, J.A.: Simulation of femtosecond pulsed laser effects on MOS electronics using TCAD Sentaurus customized models. Int. J. Numer. Model. Electron. Networks Devices Fields 23(4–5), 379–399 (2010)
Anand, S., Amin, S.I., Sarin, R.K.: Analog performance investigation of dual electrode based doping-less tunnel FET. J. Comput. Electron. 15(1), 94–103 (2016)
Yang, Y., Tong, X., Yang, L.T., Guo, P.F., Fan, L., Yeo, Y.C.: Tunneling field-effect transistor: Capacitance components and modeling. IEEE Electron Device Lett. 31(7), 752–754 (2010). https://doi.org/10.1109/LED.2010.2047240
Mookerjea, S., Krishnan, R., Datta, S., Narayanan, V.: On enhanced Miller capacitance effect in interband tunnel transistors. IEEE Electron Device Lett.
Biswas, A., Dan, S.S., Le Royer, C., Grabinski, W., Ionescu, A.M.: TCAD simulation of SOI TFETs and calibration of non-local band-to-band tunneling model. Microelectron. Eng. 1(98), 334–337 (2012)
Knoch J.: Optimizing tunnel FET performance-Impact of device structure, transistor dimensions and choice of material. In: 2009 International Symposium on VLSI Technology, Systems, and Applications, 2009 Apr 27, pp. 45–46. IEEE (2009)
Singh, K.S., Kumar, S., Nigam, K., Tikkiwal, V.A.: Tunnel field effect transistor for ultra low power applications: a review. In: 2019 International Conference on Signal Processing and Communication (ICSC), 2019 Mar 7, pp. 286–291. IEEE (2019)
Wang, P.Y., Tsui, B.Y.: Investigation into gate-to-source capacitance induced by highly efficient band-to-band tunneling in p-channel Ge epitaxial tunnel layer tunnel FET. IEEE Trans. Electron Devices 63(4), 1788–1790 (2016)
Jain, P., Kumar, D.: Drive current boosting using pocket implant near to the strained SiGe/Si source with single-metal/dual-metal double-gate tunnel field-effect transistor. In: Proceeding of International Conference on Intelligent Communication, Control and Devices, pp. 943–950. Springer, Singapore (2017)
Kumar, D., Jain, P.: Double gate tunnel field effect transistor with extended source structure and impact ionization enhanced current. Inintell. Commun., Control. Devices, pp. 973–980. Springer, Singapore (2018)
Mookerjea, S., Krishnan, R., Datta, S., Narayanan, V.: Effective capacitance and drive current for tunnel FET (TFET) CV/I estimation. IEEE Trans. Electron Devices 56(9), 2092–2098 (2009)
Shoji, M.: CMOS digital circuit technology. In: Englewood Cliffs, ch. 4, pp. 189–190. Prentice-Hall, NJ (1988)
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2021 The Author(s), under exclusive license to Springer Nature Singapore Pte Ltd.
About this paper
Cite this paper
Kumar, D., Rahi, S.B., Kuchhal, P. (2021). Investigation of Analog Parameters and Miller Capacitance Affecting the Circuit Performance of Double Gate Tunnel Field Effect Transistors. In: Choudhury, S., Gowri, R., Sena Paul, B., Do, DT. (eds) Intelligent Communication, Control and Devices. Advances in Intelligent Systems and Computing, vol 1341. Springer, Singapore. https://doi.org/10.1007/978-981-16-1510-8_33
Download citation
DOI: https://doi.org/10.1007/978-981-16-1510-8_33
Published:
Publisher Name: Springer, Singapore
Print ISBN: 978-981-16-1509-2
Online ISBN: 978-981-16-1510-8
eBook Packages: Intelligent Technologies and RoboticsIntelligent Technologies and Robotics (R0)